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Topography and physicochemical comparison of photopatterned SU-8 films for multilayer structure micromachining

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Document pages: 7 pages

Abstract: In the SU-8 standard lithography process, the characteristic height contour generated by UV exposure and different shrinkage of the mask area forms a patterned morphology. We studied the changes of wettability, film solubility and morphology of SU-8 films with different thickness, and showed the correlation between the formation of rotating flow array on the top layer made of positive photoresist. In addition, the film solubility and surface energy observed from the contact angle measurement also produce a considerable contrast. Interfacial diffusion of photoresist was also observed, followed by Rutherford backscattering. We discuss the derivation of the above effects, involving the limitations of multilayer micromachining process and the possibility of using advntage of the surface profiles obtained.

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