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Effects of rolling direction, temperature and etching time on photochemical machining of Monel 400 micro channel

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Document pages: 9 pages

Abstract: This paper describes the effect of rolling direction on the quality of microchannels fabricated using Monel 400 photochemical processing (PCM). In order to study the effect of grain orientation on microchannel etching, experiments were carried out to prepare microchannels along the rolling direction and cross rolling direction. The input parameters considered are channel width and rolling direction, while the etching depth is the response parameter. Different channels with widths of 60, 100, 150, 200 and 250   etching μ m。 The effects of etching time and etching solution temperature on microchannel undercut and depth were studied. For high-quality microchannels, the effects of spinning time, spinning speed, exposure time and photoresist film strength were also studiedaken into consideration. Optimized values of the above were used for the experimentation. The results show that the depth of etch of the microchannel increases more along the rolling direction than across the rolling direction. The channel width and depth are significantly affected by the etching time and temperature. The proposed study reports an improvement in the quality of microchannels produced using PCM.

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